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Semiconductor Technology

MIMOS Graphene Wafer (Mi-GraphWafer)

Overview

A pristine graphene material on 8-inch (200mm) wafer for enabling the manufacturing and development of next generation high performance electronics.

MIMOS Mi-GraphWafer is a state-of-the-art process technology for the development of pristine Graphene on 8-inch (200mm) wafer to enable the manufacturing and production of next generation advanced electronics. The graphene layer developed are available at the highest purity as well as uniformly-synthesised through industry-grade chemical vapour deposition (CVD) process technology.

Technology Summary

Mi-GraphWafer
State-of-the-art process technology for the development of pristine Graphene on 8-inch (200mm) wafer to enable the manufacturing and production of next generation advanced electronics.
Industries: E&E industries, SMEs, Government

Features
  • High purity
  • Uniform
  • Large area
  • Customisable
Technology Benefits
  • Pristine graphene material
  • Scalability
  • Enabling new nanomaterials development

Mi-GraphWafer comprises the following features:

 

Features

Mi-GraphWafer comprises the following features:

  • High Purity
    Pristine single layer graphene synthesised through chemical vapour deposition (CVD) method on wafer. Can be tuned for biand multi-layer graphene.
  • Uniform
    Single layer graphene coverage >90%. Top and bottom heater for uniformly-controlled growth and coverage.
  • Large Area
    Can be synthesised on substrate of up to 8” (200mm). Also accept small sample size.
  • Customisable
    Can be tuned and structured based on requirements and applications.

Technology Benefits

The main impacts of Mi-GraphWafer are:

  • Pristine Graphene Material
    High purity single layer graphene that can be transferred and utilised as a nanomaterial by itself for R&D and device development purposes. Quality of graphene controlled at a consistent and uniform manner across the substrate.
  • Scalability
    Process capability-ready. Structuring and patterning of graphene material can be executed on full wafer-scale level for device development.
  • Enabling New Nanomaterials Development
    Functionalisation of base graphene material can be achieved through multiple process add-ons for value-added purposes. Matured industry-grade chemical vapour deposition process
    technology utilised.
MIMOS Graphene Wafer
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